Zeiss

The Zeiss LSM 880 is a laser scanning confocal microscope.

The ZEISS Axioscope 5 is a smart upright microscope designed for biomedical routine and research, featuring automatic digital documentation with a Snap button and support for multiple contrast techniques.

The Zeiss Contura X 700 / X 1000 is a measuring machine manufactured by Zeiss.

Zeiss MERLIN is a scanning electron microscope at CMi reserved for imaging and process-control inspection, with support for imaging, EDX analysis, and offline analysis in ProSEM.

The Zeiss ZML 200 is an inspection station from Zeiss, placed in the Metrology & Inspection category.

The Zeiss INI 800117 is an inspection station used in semiconductor metrology and inspection.

The Zeiss AxioStar plus is a compound microscope categorized under Metrology & Inspection.

Zeiss Sigma 300 VP FE-SEM is a field emission scanning electron microscope.

The Zeiss 1540 EsB is a field emission scanning electron microscope (FE-SEM).

The Zeiss Ultra-55 SEM is used as the platform for Zyvex S-100 Nanoprobes.

The Zeiss Surfcom 1900 SD is a surface roughness meter.

The Zeiss Auriga 60 is a high-resolution DualBeam FIB-SEM workstation combining a Schottky field emission electron column with a gallium liquid metal ion source.

The Zeiss Stereo is a stereo microscope product line for observing large samples and inspecting rough material surfaces.

Zeiss O Inspect 322 is a coordinate measuring machine in the O Inspect 322 model line.

The Zeiss Leo 1530 FE-SEM is a field emission scanning electron microscope with multiple detectors and an Oxford EDX detector.

The Zeiss NVision 40 is a SEM-FIB microscope platform with a GEMINI SEM column and a SIINT zeta FIB column.

The Zeiss Axio is a series of microscopes used for routine inspection and documentation, with models including the Axio Scope.A1 offering brightfield and darkfield observation.

The Zeiss MV 0241 is a microscope categorized under Metrology & Inspection.

The Zeiss III RS Universal is a microscope with lenses and camera, used in metrology and inspection.

The Zeiss MV 0702 is a microscope in the Metrology & Inspection category with 8-inch wafer support.

The Zeiss LSM 880 is a confocal laser scanning microscope with Airyscan detection, designed for high-resolution fluorescence imaging of fixed and live samples.

The Zeiss ORION NanoFab is a focused ion beam microscope used for ultrahigh-resolution imaging, direct writing, and lithography, operating with either He or Ne beams.

The Zeiss Crossbeam 540 is an equipment model manufactured by Zeiss.

The Zeiss Sigma 300 is a field emission scanning electron microscope used for SEM imaging and related metrology and inspection workflows.

General referenceThe Zeiss Leo 1525 is a scanning electron microscope designed for high-resolution imaging and metrology applications.

The Zeiss SEM Crossbeam 550 is a scanning electron microscope configured at CMi for imaging dedicated to process control and supported with metrology and analysis software.

The Zeiss Axioplan2 is a linewidth measuring system used for optical microscopy.

The Zeiss Gemini560 is a field emission scanning electron microscope (FESEM) used for high-resolution imaging and microanalysis.

Zeiss 200 mm Scanning Electron Microscope.

The Zeiss LEO 1560 is a scanning electron microscope with a 6-inch stage and loadlock, Schottky field emission gun, and in-lens SE and E-T SE detectors.

The Zeiss NVision 40 X-Beam System includes a Kleindiek mm3a micromanipulator and gas injectors for tungsten, carbon, silicon dioxide, and water.

Zeiss Prove Reticle Mask is a metrology and inspection tool for reticle mask inspection.

The Zeiss Axio CSM 700 is a microscope with a controller.

The Zeiss Sigma HDVP is a scanning electron microscope with an acceleration voltage of 0.02 kV to 30 kV and a magnification range of 10x to 1,000,000x.

The Zeiss EVO 50 VP is a scanning electron microscope (SEM) with a 30 kV accelerating voltage.

The Zeiss EVO 60 XVP is a scanning electron microscope (SEM).

Zeiss manufactures inverted metallurgical microscopes for reflected-light materials analysis, including the Axio Vert.A1 MET and Axiovert 100A models.

The Zeiss Supra 55 VP is a variable-pressure scanning electron microscope with TFE source type, Windows 10, and SmartSEM v6.

The Carl Zeiss SteREO Lumar.V12 is a stereomicroscope designed for high-resolution fluorescence imaging with the largest specimen field in its class.

The Zeiss VL 305 X CMM is a coordinate measuring machine.

Zeiss Contura G 2 is a coordinate measuring machine described as a metrology system for precise dimensional measurement, inspection, and quality control.

The Zeiss UEM is a brightfield microscope with reflected-light illumination, binocular viewing at 45°, and a coaxial X-Y stage.

The Zeiss Jenapol is a microscope with a universal stage.

The Zeiss Axio Imager M 2 m is a microscope configured with controller and power supply, a granite stand, multiple objectives, laser autofocus, a camera, dark-bright-field cubes, and a motorized XYZ stage.

The Zeiss Supra 55 is a field-emission scanning electron microscope (FE-SEM) that operates at accelerating voltages from 0.1 to 30 kV and achieves an imaging resolution down to 1.0 nm.

The Zeiss Supra 40 VP is a scanning electron microscope described as a SEM with a Coolstage, Thermofisher EDS, and a transmitted detector issue noted.

The Carl Zeiss 1540EsB Crossbeam is a FIB/SEM system with an FESEM electron column, a Ga ion column, gas injection for Pt, W, and SiOx deposition, and multiple detector options.

The Zeiss Axioscope 7 is a microscope configured with transmitted and reflected light LED units, a trinocular phototube, a DIC manual objective turret, a right-handed XY rotary stage, a Colibri 7 fluorescent source, and a USB 3.0 color camera.

The Zeiss Axiotron 300 is an automated optical inspection microscope for wafer inspection and review, supporting 200 mm and 300 mm wafer sizes with brightfield, darkfield, and DIC observation.

The Zeiss Leo 1550 is a scanning electron microscope.