CEE
100 Spin
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
How it works
The CEE 100 allows programming of acceleration rate, hold speed, and step time for each of up to five steps per program. The acceleration can be set from 1 to 30,000 rpm/s (unloaded), the hold speed from 1 to 6,000 rpm, and the step time from 1 to 999 seconds. A typical program uses an acceleration of 10,000 rpm, a speed of 4,000 rpm, and a time of 45 seconds.[2][3]
What do the numbers mean?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What spin speed range does the CEE 100 support?
The held angular speed is programmable from 1 to 6000 rpm, and the acceleration rate from 1 to 30000 rpm/s (unloaded).[2]
How many programs can be stored, and how many steps per program?
The CEE 100 can store up to ten programmable presets, each with up to five steps.[2]
What types of spin chucks are available?
Available chucks include 2.25" (57.2 mm) and 0.3125" (7.9 mm) sizes, accommodating various substrate dimensions.[2]
Not publicly documented
The following facts about the 100 Spin are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the 100 Spin are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 100 Spin are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 100 Spin are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 100 Spin are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 100 Spin are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]https://nanofab.ku.edu/sites/nanofab/files/files/SOPs/PDMS%20CEE%20100%20Spinner%20SOP.pdf — nanofab.ku.edunanofab.ku.edu
- [3]https://www.nanofab.utah.edu/wp-content/uploads/2022/12/CEE-100-Procedure.pdf.pdf — nanofab.utah.edunanofab.utah.edu
Last updated Oct 2, 2026.
Compare with similar tools
View all →
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.
The TEGAL 211 is a table top plasma etcher/asher for up to 3-inch wafers with an aluminum chamber.