Tool family
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| CEE 100CB | — | — | Includes a hotplate; available in table top and bench mount configurations | nanofab.ece.cmu.edu[1] |
The CEE 100 CB Spin is a spin coater from the CEE 100 family.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| CEE 100 CB Spin Coater Hot Plate | — | — | Includes a hot plate and a flow controller | waferpedia.com[2] |
The CEE 100 CB is a spin coater/hot plate with a flow controller.
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
The CEE 100 CB Spin is a spin coater from the CEE 100 family.
The CEE 100 CB is a spin coater/hot plate with a flow controller.
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.