Laurell

The Laurell WS-1000MH is a mini wet station in the WS-1000MH series of mini spin-process stations.

The Laurell SU-8 is a spin station dedicated to applying SU-8 photoresist for lithography processes.

The Laurell WS-750Lz-23B is a spin coater in the 750 Series. The Laurell WS-750Lz-23B has a maximum substrate size of ø150mm (5" x 5") and a maximum speed of 12,000 rpm.

The Laurell EDC-HL-15 B is a 650-series EDC spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.

The Laurell Lz-23 B is a compact 650-series spin coater that accommodates up to 150 mm wafers and 5 in × 5 in substrates.

The Laurell WS-1000 is a wet station in the WS-1000 Series Spin-Process Stations line.

The Laurell EDC-650-23 is a 650-series spin processor that accommodates up to Ø 150 mm wafers and 5" × 5" substrates.

The Laurell EDC-650-15 is a station-mounted 650-series spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.

The Laurell WS-650-23 B is a compact spin coater for up to 150 mm wafers and 5"×5" substrates, with a maximum rotational speed of 12,000 RPM based on a 100 mm silicon wafer.

The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.

The Laurell H6-23 is a compact HL Series spin coater for wafers and substrates, with a maximum rotational speed of 12,000 RPM.

The Laurell WS-650-8B is a compact 650-series spin coater with a maximum rotational speed of 12,000 RPM and support for wafers up to 200 mm.

The Laurell 750 Series is a spin coater line for spin coating applications.

Laurell WS-650-23B is a 650 Series spin coater with a maximum substrate size of ø150mm (5" × 5") and a maximum speed of 12,000 rpm.

The Laurell WS-650-8B is a spin coater in the 650 Series with a maximum substrate size of ø200mm (7" x 7") and a maximum speed of 12,000 rpm.

The Laurell WS-650-15B is a spin coater in the 650 Series.

The Laurell EDC-650-23B is an EDC System spin coater from the 650 Series, supporting substrates up to 150mm diameter and spin speeds up to 12,000 rpm.

The Laurell EDC-650-8B is an EDC System 650 Series spin coater with a maximum substrate size of 200mm (7" x 7").

The Laurell WS-650-23 B is a 650-series spin coater. The Laurell WS-650-23 B has a maximum substrate size of ø 150mm (5" x 5") and a maximum speed of 12000 rpm.

The Laurell WS-650-8 B is a 650-series spin coater with a maximum substrate size of 200mm (7" x 7") and a maximum speed of 12000 rpm.

The Laurell EDC-650-23 B is an EDC System 650-series spin coater with a maximum substrate size of ø 150mm (5" × 5") and a maximum speed of 12000 rpm.

The Laurell EDC-650-8 B is an EDC System 650-series spin coater with a maximum substrate size of ø 200mm (7" × 7") and a maximum speed of 12000 rpm.

Laurell EDC-650-15 B is an EDC System 650-series spin coater with a maximum substrate size of 300mm (9" x 9").

The Laurell H6-23 B is a Spin Coater in the 650-series. The Laurell H6-23 B accepts a maximum substrate size of ø 150mm (5" × 5") and is rated to 12000 rpm.

The Laurell H6-8 B is a spin coater in the 650-series with a maximum substrate size of 200mm (7" x 7"), a maximum speed of 12000 rpm, and tabletop, in-deck, or on-deck mounting options.

The Laurell EDC-HL-23 B is an EDC System 650-series spin coater with a maximum substrate size of 150 mm (5" x 5") and a maximum speed of 12000 rpm.

Laurell EDC-HL-8 B is an EDC System 650-series spin coater with a maximum substrate size of 200mm (7" x 7").

The Laurell EDC-HL-15 B is an EDC™ System spin coater in the 650-series. The Laurell EDC-HL-15 B accepts a maximum substrate size of 300mm (9" x 9") and reaches 12000 rpm.

The Laurell Lz-23 B is a 650-series spin coater that accepts substrates up to 150mm (5×5 inches) and spins up to 12000 rpm.

The Laurell EDC-650-15B is an EDC System spin coater. The Laurell EDC-650-15B supports a maximum substrate size of 300 mm (9" x 9").

The Laurell WS-750-23 B is a 750-series spin coater that processes substrates up to 150mm (5" x 5") with a maximum speed of 12000 rpm and offers tabletop, in-deck, or on-deck mounting options.

The Laurell H6-15 B is a spin coater in the 650-series. The Laurell H6-15 B supports a maximum substrate size of 300mm (9" x 9") and a maximum speed of 12000 rpm.

The Laurell EDC-650-8 is a station-mounted spin processor that accommodates up to 200 mm wafers and 7 in x 7 in substrates.

The Laurell WS-650-23 is a station-mounted spin coater in the WS-650 series that accommodates up to ø 150 mm wafers and 5" × 5" substrates.

The Laurell WS-650 is a spin coater used for spincoating photoresists.

Laurell's WS-400-6NPP is a 400-series spin coater with a 400-series process controller, a 1.75" vacuum chuck, and support for wafers up to 150 mm.

The Laurell EDC-HL-8 B is a compact EDC spin processor that accommodates up to 200 mm wafers and 7 in × 7 in substrates.

The Laurell H6-15 is a compact HL Series spin coater designed for glove box use and specified to accommodate up to ø 300mm wafers and 9" × 9" substrates.

The Laurell H6-8 is a 650-series HL spin coater that accommodates up to 200mm wafers and 7" × 7" substrates and has a maximum rotational speed of 12,000 RPM.

The Laurell WS-650-15 is a station-mounted spin coater in the 650-series that accommodates up to 300mm wafers and 9" × 9" substrates and reaches a maximum rotational speed of 12,000 RPM.

The Laurell WS-650Mz-8NPPB is a spin coater that can take up to 8 inch wafers and go up to 10000 rpm.

The Laurell WS-650-15 B is a 650-series spin coater for resist processing that accommodates up to 300mm wafers and reaches 12,000 RPM.