Laurell
The Laurell WS-650-8B is a spin coater. The Laurell WS-650-8B accommodates up to 200mm wafers and 7" x 7" substrates. The Laurell WS-650-8B features a maximum rotational speed of 12,000 RPM based on a 100mm silicon wafer.[1][2][3]

Wafer size
200mm
Power
95 to 240VAC, 47/63HZ, ~300 Watts[1]
The WS-650-8 uses a process controller that allows real-time operator interaction during a run, including pausing, stopping, and continuing the process.[1][2][3]
The WS-650-8 uses a closed bowl design with a labyrinth seal and nitrogen purge to reduce chemical contamination of the motor and electronics and to support cleaner coating conditions.[1][2][3]
Documented failure modes, common issues, and field considerations.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| WS-650-8B | — | — | — | web.archive.org[1] |
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Such machines are used with photoresists, polymers, dielectric coatings, and other liquids that can form a uniform film when spun.
Final film quality depends on the liquid properties, dispense method, rotation profile, drying behavior, and the condition of the substrate surface.
The following facts about the WS-650-8 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650-8 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the WS-650-8 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the WS-650-8 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the WS-650-8 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the WS-650-8 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Oct 5, 2026.
The Laurell EDC-HL-8 B is a compact EDC spin processor that accommodates up to 200 mm wafers and 7 in × 7 in substrates.
The Laurell H6-8 is a 650-series HL spin coater that accommodates up to 200mm wafers and 7" × 7" substrates and has a maximum rotational speed of 12,000 RPM.
Laurell's WS-400-6NPP is a 400-series spin coater with a 400-series process controller, a 1.75" vacuum chuck, and support for wafers up to 150 mm.
The Laurell EDC-HL-15 B is a 650-series EDC spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.