Comparison ledger
KLA .496 PSL Wafer, Zeiss Supra 55 VP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Supra 55 VPZeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | Zeiss Supra 55 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Variable pressure[3] |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Windows OS | — | W10[3] |
| Software | — | SmartSEM (v6)[3] |
| Source Type | — | TFE[3] |
| Primary pump | — | turbo[3] |
| Instrument type | — | Field emission scanning electron microscope (FE-SEM)[4] |
| Operating modes | — | High vacuum and variable pressure[4] |
| Field emission cathode | — | Present[5] |
| Accelerating voltage range | — | 100 V to 30 kV[5] |
| Variable pressure range | — | 2 to 133 Pa[4] |
| Magnification | — | 12 to 900,000x[4] |
| Electron image resolution | — | 1.0 nm at 15 kV; 1.7 nm at 1 kV; 3.5 nm at 0.2 kV; 2.0 nm at 30 kV in VP mode[4] |
| Sample stage | — | 5-axes motorized Cartesian sample stage[4] |
| Probe current | — | 4 pA to 10 nA[4] |
| Probe current optional upper limit | — | 20 nA optional[4] |
| Detectors | — | In-lens detector, Everhart-Thornley detector, secondary detector, VP-SE detector, and 4-quadrant backscattered electron detector[5] |
| Accessories | — | EDS detector, EBSD[4] |
| Control system OS | — | Windows 10[3] |
| Secondary electron detector | — | Everhart-Thornley secondary electron detector[3] |
| In-lens detector | — | Present[3] |
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