Tokyo Electron
Clean Track ACT 8 Multi Block
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Tokyo Electron Clean Track ACT 8 Multi Block is a resist processing tool in the lithography and photoresist category. The machine is a multi block coater and developer track.[1][2][4]
The Clean Track ACT 8 Multi Block is a photoresist spin-coater and developer track. The tool belongs to the class of wafer coat-develop systems used to apply resist, bake it, and develop patterned resist in support of lithography.[3]
Applications
The Clean Track ACT 8 Multi Block is used for wafer photoresist processing in semiconductor lithography. The equipment is used for spin coating and developing resist films that support pattern transfer.[3][1][2]
What do the numbers mean?
Wafer handling2
Gas & chemistry6
Optics & imaging1
Control & software1
Configuration & options6
Observed configurations
How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.
Unit as listed[1]
- 200mm
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| ACT8 Multi Block 3C/3D | — | — | Described as a specific configuration of the ACT8 Multi Block currently running in production | macquarie.com[2] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- TypeMulti Block (Resist Coater/Developer)[2]
- Equipment classResist Processing Equipment[1]
- PurposePhotoresist spin-coater and developer[3]
- Resist TypesNegative tone and positive tone[3]
- Pre-wet SolventsCyclopentanone or HMDS[3]
- Equipment TypeResist Processing Equipment / Multi Block (Resist Coater/Developer)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Clean Track ACT 8 Multi Block are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the Clean Track ACT 8 Multi Block are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Clean Track ACT 8 Multi Block are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Clean Track ACT 8 Multi Block is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Clean Track ACT 8 Multi Block are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Clean Track ACT 8 Multi Block are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]wotol.comwotol.com
- [2]macquarie.com — macquarie.commacquarie.com
- [3]c2mi.ca — c2mi.cac2mi.ca
- [4]fabsurplus.com — fabsurplus.comfabsurplus.com
Last updated Oct 10, 2026.
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