Tegal
The Tegal 981ACS is a scaled-up version of the Tegal 901ACS diode RIE system. The Tegal 981ACS is built to handle 150 mm and 200 mm diameter wafers, as well as 100 mm square and 6-inch square wafers. The Tegal 981ACS is used for non-critical photoresist removal, photoresist trimming, large-scale etching, planarization, and backside etching.[1]
Process applications and technology nodes documented for this tool.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The Tegal 981ACS handles 150 mm and 200 mm diameter wafers, as well as 100 mm square wafers and 6-inch square wafers.[1]
The Tegal 981ACS is a scaled-up version of the Tegal 901ACS, sharing the same features: a small footprint, an intuitive touchscreen interface, and long-lasting, low-maintenance parts.[1]
The Tegal 981ACS uses a wide-gap diode reactor design, similar to the 901ACS, which is suited for low-temperature plasma etch operations without clamps or electrostatic mechanisms for wafer manipulation.[1]
Yes, the Tegal 981ACS is commonly used for BioChip nanotechnology applications.[1]
The following facts about the 981ACS are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 981ACS are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 981ACS are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 981ACS are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 981ACS are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 981ACS is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Oct 3, 2026.
The Tegal 900e Series is a single-wafer cassette-to-cassette plasma etch system for non-critical plasma etch processes on 3 in to 150 mm wafers.
The Tegal 981 is a plasma etch tool for thin film head fabrication, described as achieving precise photoresist descum with 4:1 anisotropy at low processing temperatures in oxygen-free plasmas.
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.