Onto Innovation
Nanospec II Film Thickness Measurement
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Nanospec II is a film thickness measurement system. The Nanospec II is made by ONTO / Nanometrics. The Nanospec II supports 8-inch wafers.[1]
What it is
The Onto Innovation Nanospec II is a film thickness measurement system.[1]
How it works
General reference — not yet source-verifiedSystems in this class typically operate on the principle of optical interferometry or reflectometry. A light source is directed at the wafer surface, and the reflected spectrum is recorded. The system models the theoretical reflectance of a layered structure and fits it to the measured data to derive film thickness and optical constants.
Where it fits in the process flow
General reference — not yet source-verifiedIn the semiconductor manufacturing process flow, film thickness measurement tools are used in the metrology and quality assurance stage after thin-film deposition steps. Processes such as chemical vapor deposition, atomic layer deposition, sputtering, or spin coating are typical upstream steps. The data from thickness measurements can be used for statistical process control or to determine whether a wafer can proceed to the next stage of fabrication.
Applications
General reference — not yet source-verifiedThe system can also be applied in failure analysis and reverse engineering by characterizing unknown layer stacks. In research and development, it supports the characterization of new materials and deposition processes.
What do the numbers mean?
Wafer handling1
Configuration & options3
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Nanospec II Film Thickness Measurement are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Nanospec II Film Thickness Measurement are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Nanospec II Film Thickness Measurement are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Nanospec II Film Thickness Measurement are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Nanospec II Film Thickness Measurement are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Nanospec II Film Thickness Measurement is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Inventory photo
Last updated Sep 30, 2026.
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