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MKS

Vision 2000-C™

MKS Vision 2000-C™ family
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MKSVision 2000-C™
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What it is

The MKS Vision 2000-C is a residual gas analyzer (RGA) designed for use in semiconductor fabrication processes, specifically chemical vapor deposition (CVD) and atomic layer deposition (ALD).[1]

The Vision 2000-C is one of a family of Vision series RGAs that also includes the Vision 2000-A and Vision 2000-E models.[1]

How it works

The Vision 2000-C provides continuous in situ monitoring of the process chamber atmosphere.[1]

The instrument supports baseline monitoring to detect air leaks and background contamination within the vacuum system.[1]

The Vision 2000-C includes a Remote Vacuum Controller (RVC) for failsafe vacuum operation.[1]

The device has a minimum detectable partial pressure of less than 2.7 × 10⁻⁹ Pa (less than 2 × 10⁻¹¹ Torr).[1]

Where it fits in the process flow

The Vision 2000-C is intended for CVD and ALD processes, which are used to deposit thin films on wafers under low-pressure conditions.[1]

Applications

The MKS Vision 2000-C is applied to multi-pressure, CVD, and ALD processes within semiconductor manufacturing.[1]

The RGA is used for continuous in situ monitoring of the process environment, enabling detection of air leaks and background contamination.[1]

  • Multi-pressure processes
  • Chemical Vapor Deposition (CVD)
  • Atomic Layer Deposition (ALD)

What do the numbers mean?

Vacuum & pumping2

Minimum Detectable Partial Pressure
<2.7e-9 Pa (<2e-11 Torr)[1]
Accurate?
Remote Vacuum Controller
RVC for failsafe vacuum operation[1]
Accurate?

Configuration & options2

Monitoring Type
Continuous in situ monitoring[1]
Accurate?
Baseline Monitoring
Air leaks and background contamination[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Vision 2000-E™——Grouped with Vision 2000-C in the same product description; listed as having identical specifications for multi-pressure, CVD & ALD processesapi.p1.mks.com[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Minimum Detectable Partial Pressure<2.7e-9 Pa (<2e-11 Torr)[1]
  • Remote Vacuum ControllerRVC for failsafe vacuum operation[1]

Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the Vision 2000-C™ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Vision 2000-C™ are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Vision 2000-C™ are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Vision 2000-C™ are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Vision 2000-C™ is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Vision 2000-C™ are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]api.p1.mks.com — api.p1.mks.comapi.p1.mks.com
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Last updated Sep 22, 2026.

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