Lam Research
2300 Versys Kiyo
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Lam Research 2300 Versys Kiyo is a plasma etch system for processing 300 mm wafers. The 2300 Versys Kiyo is designed for etching polysilicon films and is part of the 2300 series from Lam Research. The 2300 Versys Kiyo can be configured with up to four Kiyo MCX process chambers.[1][2]
What it is
How it works
The Lam Research 2300 Versys Kiyo Polysilicon can be configured with up to four Kiyo MCX process chambers.[1]
The Lam Research 2300 Versys Kiyo Polysilicon includes a transfer chamber, an atmospheric robot with a single end effector, a vacuum transfer module robot with dual end effectors, and a dual wafer-slot airlock vacuum system with nitrogen purge.[1]
Where it fits in the process flow
The Lam Research 2300 Versys Kiyo Polysilicon is part of the 2300 series from Lam Research.[1]
Applications
The Lam Research 2300 Versys Kiyo Polysilicon is designed for etching polysilicon films.[1]
What do the numbers mean?
Power & electrical2
Vacuum & pumping1
- Chamber Design
- Dual-chamber configuration with isolated process and exhaust zones[2]2 sources
Wafer handling6
- Configuration (Kiyo 2300 V2)
- 4 Kiyo CX chambers, 3 load ports, ATM robot with one end effector, VTM robot with dual end effectors, software version SP15-HF6, communication protocols RS232 and LON[1]
- Configuration (Kiyo 2300 V2)
- 4 Kiyo CX chambers, 3 load ports, ATM robot with one end effector, VTM robot with dual end effectors, software SP15-HF6, comms RS232 and LON[4]
Gas & chemistry2
- Gas Configuration
- Up to 10 gas lines, including reactive gases (CF₄, Cl₂, HBr) and radicals (O₂, N₂)[2]
Configuration & options3
Vintage & configurations
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Power System3kW RF generator with independent bias and source tuning[2]
- Gas ConfigurationUp to 10 gas lines, including reactive gases (CF₄, Cl₂, HBr) and radicals (O₂, N₂)[2]
- Chamber DesignDual-chamber configuration with isolated process and exhaust zones[2]
- Plasma Source Frequencies13.56 MHz + 2 MHz[2]
- Gas ConfigurationUp to 10 gas lines[4]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size does the 2300 Versys Kiyo support?
The 2300 Versys Kiyo supports 300 mm (12-inch) wafers.[3][1][4]
How many process chambers can the 2300 Versys Kiyo have?
The system can be configured with up to four Kiyo MCX process chambers.[1][4]
What is the throughput of the 2300 Versys Kiyo?
The system achieves a throughput of 60 to 100 wafers per hour, depending on the process node.[4][2]
Not publicly documented
The following facts about the 2300 Versys Kiyo are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2300 Versys Kiyo are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 2300 Versys Kiyo are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 2300 Versys Kiyo are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 2300 Versys Kiyo is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 2300 Versys Kiyo are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]caladansemi.com — caladansemi.comcaladansemi.com
- [3]Equipment inventory listing
- [4]waferpedia.com — waferpedia.comwaferpedia.com
- [5]globaltechsolutions.com.sg — globaltechsolutions.com.sgglobaltechsolutions.com.sg
Last updated Sep 30, 2026.
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