EV Group

EV-420

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The EVG EV-420 is a front and backside contact mask aligner. The EVG EV-420 uses a UV source for exposure. The EVG EV-420 is used for contact alignment in lithography processes.^[1]^[2]^[3]^[4]

EV GroupEV-420

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What it is

The EVG EV-420 is a front and backside mask aligner used for photolithography.^[1]^[2]^[3]

How it works

General reference — not yet source-verified

Mask aligners expose the photoresist through a photomask that is brought into close proximity or direct contact with the substrate.

Where it fits in the process flow

General reference — not yet source-verified

In a semiconductor or MEMS fabrication flow, mask alignment and exposure occur after the substrate has been coated with photoresist and before the resist is developed.

Applications

General reference — not yet source-verified

Front and backside mask aligners are used for fabricating devices where patterns need to be aligned on both sides of a wafer, such as in certain MEMS and microfluidic devices.

lithography

What do the numbers mean?

Optics & imaging6

Equipment type: front & backside mask aligner^[3]
Type: Front & backside mask aligner^[1]
Exposure source: UV^[4]
Exposure dose (as stated): 625 mJ/cm²^[4]
Type: Contact mask aligner with front and backside alignment^[1]
UV source intensity: 625 mJ/cm² (measured during exposure)^[4]

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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the EVG EV-420?

It is a lithography tool.^[3]^[1]

Where is the EVG EV-420 used in the process flow?

It is part of the lithography section of the cleanroom, alongside mask aligners and direct-write patterning tools.^[3]^[1]

Not publicly documented

The following facts about the EV-420 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EV-420 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EV-420 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EV-420 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EV-420 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EV-420 is not on record.
Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources

[1]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
[2]https://www.nanofab.utah.edu/wp-content/uploads/2020/04/NF-tool-list-April-2020.pdf — nanofab.utah.edunanofab.utah.edu
[3]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
[4]repository.tudelft.nl — repository.tudelft.nlrepository.tudelft.nl