AJA
The AJA TR5313 is a triangular magnetron sputter source. The AJA TR5313 is a specialty source designed to optimize deposition uniformity onto a circle of substrates up to 8 inches in diameter. The AJA TR5313 is used in the ATC-B-3400 mask making tool to deposit up to three materials per batch for optimum uniformity.[1][2][3]

Wafer size
up to 8-inch diameter substrates
Optics
used in the ATC-B-3400 mask making tool[1]
The AJA TR5313 operates as a triangular magnetron sputter source, a type of physical vapor deposition source that uses a magnetic field to confine electrons near the target surface, enhancing the sputtering rate.[1][2][3]
The AJA TR5313 is a sputter source that is used in a batch coating system, where it deposits thin films onto multiple substrates in a single run.
The AJA TR5313 is used in mask making, specifically as part of the ATC-B-3400 system, which processes up to six wafers of a certain size per batch and deposits up to three materials.[1][2][3]
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The following facts about the TR5313 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TR5313 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the TR5313 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the TR5313 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TR5313 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TR5313 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 4, 2026.
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