Waferpedia

Comparison ledger

D600versusRPM 2000 PL Mapper

KLA D600, Onto Innovation RPM 2000 PL Mapper, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
D600KLA
RPM 2000 PL MapperOnto Innovation
OEMKLAOnto Innovation
CategoryMetrology & InspectionMetrology & Inspection
Wafer size2"2"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
GenerationD-series—
FamilyKLA D600Onto Innovation RPM 2000 PL Mapper
Specifications
Instrument typeStylus surface profiler[1]—
Measurement purposeThin and thick film step height measurement[1]—
Wafer compatibility2", 4", 6", and 8" wafers[1]—
Field of view3780 x 3120 um[1]—
Digital zoomx4[1]—
Scan length range55 mm with stitching option[1]—
Vertical range1 mm[1]—
Step-height repeatability5A[1]—
Force range0.03 to 15 mg[1]—
Digital Zoom4x digital zoom[1]—
Step-Height Repeatability5A (5 angstroms)[1]—
Measurement applicationAdvanced thin- and thick-film step height measurement[1]—
DocumentationD Series User Manual[1]—
Typestylus surface profiler[1]—
Measurement functionthin and thick film step height measurement[1]—
Configuration—785nm and almost new 532nm lasers (suitable for most As-P materials)[2]
Wafer size—2"-6" wafer size range[2]
OEM—ONTO / Nanometrics[2]
Model—RPM 2000[2]
Wafer sizes—2, 3, 4, 5, 6 inch[2]
Wafer chuck—2" and 3" wafer chuck[3]
Laser wavelength—785nm and almost new 532nm lasers[2]
Detectors—InGaAs and Si CCD detectors[2]
Light source—White light source[2]
Measurement applications—Thickness, VCSEL, DBR measurements[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.ch
  2. [2]inventory listing
  3. [3]inventory listing