Waferpedia

Comparison ledger

DCS 1440 Wafer Cleaner SpinversusDCS 1460 Wafer Cleaner Spin

Disco DCS 1440 Wafer Cleaner Spin, Disco DCS 1460 Wafer Cleaner Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMDiscoDisco
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyDisco DCSDisco DCS
Specifications
Configuration5 in. table[1]Table upgrade for VCSEL cleaning[3]
Max. workpiece sizeΦ8 inch[2]Φ300 mm[4]
Table RPM100 - 3000 min^-1[2]100 to 3,000 min^-1[4]
Setting time for cleaning/drying0 - 999 sec[2]0 to 999 sec[4]
Cleaning nozzle speed1 - 37.5 °/sec[2]1 to 37.5 °/sec[4]
Cleaning rangeΦ365 mm (up to 210 x 210 mm)[2]Φ450 mm (up to 310 x 310 mm)[4]
Cleaning pressure range2.3 - 11.8 MPa[2]2.3 to 11.8 MPa[4]
Equipment dimensions (W×D×H)400 × 600 × 1220 mm[2]500 × 650 × 1,220 mm[4]
Dry massApprox. 124 kg[2]—
Voltage200-240 VAC[1]—
Frequency50/60 Hz[1]—
Table size5 in.[1]—
Arm configurationDouble arm[1]—
Wiring3 Wire + ground[1]—
Maximum workpiece size—Φ300 mm[4]
Application frame—2-12[4]
Table RPM range—100 to 3,000 min⁻¹[4]
Equipment weight (Dry mass)—Approx. 144 kg[4]
Cleaning nozzles—Standard high pressure cleaning nozzle; optional atomizing cleaning nozzle; dual nozzle configuration possible[4]
Operator interface—4 inch LCD touch panel[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]disco.co.jpdisco.co.jp
  3. [3]inventory listing
  4. [4]disco.com.sgdisco.com.sg