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Comparison ledger

N 9030 Aversus0010-03485 Magnet Assy

Agilent N 9030 A, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
N 9030 AAgilent
0010-03485 Magnet AssyApplied Materials
OEMAgilentApplied Materials
Category——
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FamilyAgilent N 9030 AApplied Materials 0010-03485 Magnet Assy
Cited variants—
Specifications
Frequency range (DC coupled)3 Hz to 3.6 GHz (Option 503); 3 Hz to 8.4 GHz (Option 508); 3 Hz to 13.6 GHz (Option 513); 3 Hz to 26.5 GHz (Option 526); 3 Hz to 43 GHz (Option 543); 3 Hz to 44 GHz (Option 544); 3 Hz to 50 GHz (Option 550)[2]—
Frequency range (AC coupled)10 MHz to 3.6 GHz (Option 503); 10 MHz to 8.4 GHz (Option 508); 10 MHz to 13.6 GHz (Option 513); 10 MHz to 26.5 GHz (Option 526)[2]—
Analysis bandwidth (standard)10 MHz[2]—
Analysis bandwidth (Option B25)25 MHz[2]—
Analysis bandwidth (Option B40)40 MHz[2]—
Analysis bandwidth (Option B85)85 MHz[2]—
Analysis bandwidth (Option B1X)160 MHz[2]—
Resolution bandwidth (RBW) range1 Hz to 3 MHz (10% steps), 4, 5, 6, 8 MHz; with Option B85 and Option RBE: 10, 15, 20, 25, 30, 40, 50, 60, and 70 MHz; with Option B1X and Option RBE: 10, 15, 20, 25, 30, 40, 50, 60, 70, 80, 100, and 133 MHz[2]—
Phase noise (CF = 1 GHz, specification, 10 kHz offset)-130 dBc/Hz[1]—
Displayed average noise level (DANL, preamp off, 10 MHz to 1.2 GHz)-153 dBm (specification typical with sample or average detector, 0 dB input attenuation, 1 Hz RBW)[2]—
Weight (net, without options)22 kg (48 lbs) nominal[1]—
Dimensions (H x W x D)177 mm x 426 mm x 556 mm (7.0 in x 16.8 in x 21.9 in)[1]—
Operating temperature range0 to 55 °C[1]—
Power consumption (on, fully loaded)450 W[1]—
Display resolution1024 x 768 XGA, 213 mm (8.4 in) diagonal[1]—
Configuration—WP AL 300mm PVD[3]
OEM—Applied Materials[3]
Model—0010-03485[3]
Description—MAGNET ASSY, WP AL 300MM PVD[4]
Process—PVD[5]
Wafer size—300mm[6]
Version—Spares[6]
Part Number—0010-03485[3]
Manufacturer—Applied Materials[3]
Process Type—PVD (Physical Vapor Deposition)[3]
Application (Material)—Aluminum (AL)[3]
Wafer Diameter (associated)—300 mm[3]
Sources (6)Every fact above is drawn from these public sources
  1. [1]testequipment.centertestequipment.center
  2. [2]keysight.comkeysight.com
  3. [3]inventory listing
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]layla-ec.comlayla-ec.com
  6. [6]fabsurplus.comfabsurplus.com