STS
Multiplex ICP alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Plasma-Therm
770
100mm
Etch
The Plasma-Therm 770 SLR series is an inductively coupled plasma (ICP) etch system used for dry etching of materials such as silicon, SiO₂, Si₃N₄, and compound semiconductors.
Oxford Instruments
PlasmaPro 100 Cobra
100mm
Etch
The Oxford PlasmaPro 100 Cobra is an etcher with 8 inch wafer size, an ICP chamber with Cl2 and BCl3 capability, and three RIE chambers.
Oxford Instruments
PlasmaPro100
100mm
Etch
Oxford PlasmaPro100 is an ICP plasma etcher for 100mm wafers used for chlorine and bromine chemistry.
Tegal
6510
100mm
Etch
The Tegal 6510 is a high-density CCP plasma etch tool with dual-frequency RF power application and magnetic plasma confinement.
Tegal
6520
100mm
Etch
The Tegal 6520 is a high-density CCP plasma etch tool with dual-frequency RF power application and magnetic plasma confinement.
Tegal
6540
100mm
Etch
The Tegal 6540 is a high-density plasma etch system used for etching difficult-to-etch materials in MEMS and related semiconductor applications.
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