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Comparison ledger

EDC-650-8BversusWS-650-8B

Laurell EDC-650-8B, Laurell WS-650-8B, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
EDC-650-8BLaurell
WS-650-8BLaurell
OEMLaurellLaurell
CategoryResist ProcessingResist Processing
Wafer size200mm200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLaurell EDC-650-8BLaurell WS-650-8B
Specifications
ModelEDC-650-8B[1]—
TypeEDC System[1]spin coater[1]
Series650 Series[1]650 Series[1]
Max substrate size200mm (7" x 7")[1]ø200mm (7" x 7")[1]
Max RPM12,000 rpm[1]12,000 rpm[1]
Mounting optionsTabletop, In-Deck, On-Deck[1]Tabletop, In-Deck, On-Deck[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]laurell.comlaurell.com