Comparison ledger
KLA .498 PSL Wafer, Olympus OLS 5100 SAF, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | OLS 5100 SAFOlympus | |
|---|---|---|
| OEM | KLA | Olympus |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | Olympus OLS |
| Specifications | ||
| Configuration | NIST Traceable[1] | High magnification[2] |
| NIST traceability | Yes[1] | — |
| Equipment type | — | microscope system[3] |
| Magnification | — | high magnification[2] |
| Imaging | — | differential interference contrast (DIC)[2] |
| Stage | — | motorized stage[2] |
| Desk | — | anti-vibration desk[2] |
| Included | — | computer and software[2] |
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