Comparison ledger
KLA .496 PSL Wafer, Zeiss Sigma 300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Sigma 300Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | Zeiss Sigma 300 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | NIST Traceable[2] | — |
| Wafer size | 8 inch[2] | — |
| Traceability | NIST Traceable[2] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[2] | — |
| Category | Metrology & Inspection[3] | — |
| Make | — | Zeiss[4] |
| Model | — | Sigma 300[4] |
| Type | — | Field emission scanning electron microscope[5] |
| Acceleration voltage | — | 0.02-30kV[5] |
| Probe current | — | 3pA-20nA[5] |
| Magnification | — | x10-1M[5] |
| Specimen stage | — | 5-axes motorized eucentric specimen stage (X,Y=130mm, Z=50mm, T=-3deg-70deg, R-360deg)[5] |
| Detectors | — | Everhart Thornley Secondary Electron Detector; Inlens Secondary Electron Detector[5] |
| Low kV performance | — | approaching 1.5 nm at 1kV[5] |
| Vintage | — | 2018[4] |
| Instrument type | — | Field emission scanning electron microscope[5] |
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