Waferpedia

Comparison ledger

.496 PSL Waferversus600i

KLA .496 PSL Wafer, Nova 600i, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
600iNova
OEMKLANova
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .496 PSL WaferNova 600i
Specifications
ConfigurationNIST Traceable[1]—
Wafer size8 inch[1]—
TraceabilityNIST Traceable[1]—
Compatible systemsCapable on Surfscan 6xy0 and SP1[1]—
CategoryMetrology & Inspection[2]Focused Ion Beam (FIB)-SEM[3]
Model—Nova 600i Dual Beam[3]
OEM—FEI[3]
Beam configuration—Dual-beam system combining Ga FIB with FESEM (thermal field emitter)[3]
Gas injection—Multiple gas injector system for deposition of Pt and SiO₂[3]
Manipulator—PC-controlled nanometer-resolution manipulator[3]
Capability—TEM sample preparation capability[3]
Electron beam resolution @ optimum WD—1.1 nm @ 15 kV; 2.5 nm @ 1 kV[4]
Electron beam resolution @ coincident point—1.5 nm @ 15 kV; 2.0 nm @ 5 kV[4]
Ion beam resolution @ coincident point—7.0 nm @ 30 kV (5.0 nm achievable)[4]
Electron beam accelerating voltage—200 V to 30 kV[4]
Ion beam accelerating voltage—500 V to 30 kV[4]
Electron beam probe current—≤ 20 nA in 21 steps[4]
Ion beam probe current—1.5 pA to 20 nA (15 position aperture strip)[4]
Stage travel (X,Y)—150 mm, piezo-driven[4]
Maximum sample diameter—150 mm[4]
Detectors—In-lens TLD (SE and BSE), Everhardt Thornley SED, IR camera[4]
Column angle—52° between electron and ion columns[4]
Gas injection system—Up to 5 injectors; common chemistries include Pt, W, C, and enhanced etch[4]
Operating system—Windows XP SP2[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]colorado.educolorado.edu
  4. [4]yumpu.comyumpu.com
  5. [5]tssmicroscopy.comtssmicroscopy.com