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Comparison ledger

0010-03485 Magnet AssyversusiH 1000 Dry

Applied Materials 0010-03485 Magnet Assy, Edwards iH 1000 Dry, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run—1990–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards iH 1000 Dry
Cited variants—
  • iH1000[1]
  • iH1000 Enhanced[1]
  • iH1000 HEAC[1]
  • iH1000 New Look[1]
  • iH1000 Mark V[1]
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]iH 1000[6]
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]Edwards[6]
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Product type—Dry pump[7]
Inlet connection—ISO 100[8]
Outlet connection—KF 40[8]
Pumping speed—560 cfm[8]
Ultimate pressure—1.5x10-3 Torr[8]
Motor—3 Phase, 208V, 50/60Hz[7]
Weight—948 lbs[7]
Voltage / frequency—200-208 V, 50/60 Hz[8]
Power input—3.5 kW[8]
Rated motor power—5.1 kW[8]
Oil capacity—1.48 l[8]
Dimensions—909 x 839 x 390 mm[7]
Sources (8)Every fact above is drawn from these public sources
  1. [1]trilliumus.comtrilliumus.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]Equipment inventory listing
  7. [7]provac.comprovac.com
  8. [8]ajvs.comajvs.com