Tegal
6500 HRe-
The Tegal 6500 HRe- is a dual-frequency etch system series. The Tegal 6500 HRe- hosts a cluster of plasma etching tools. The Tegal 6500 HRe- can be configured with one or two etching chambers.[1]
What it is
The Tegal 6500 HRe- is a dual-frequency plasma etch system series used for reactive ion etching in semiconductor processing.[1]
The Tegal 6500 HRe- is a cluster of plasma etching tools that can be configured with one or two etching chambers.[1]
How it works
Where it fits in the process flow
The Tegal 6500 HRe- is used for etching operations that require precise plasma control and sub-micron feature transfer.[1]
Applications
The Tegal 6500 HRe- is used for precise plasma etching down to the sub-micron level.[1]
- Plasma etching
What do the numbers mean?
Wafer handling1
Performance1
Configuration & options6
- Plasma generation
- Dual frequencies for high-density, capacitively coupled plasma (CCP) generation[1]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 6510 | — | — | Capable of gate etching in polysilicon and shallow trench isolation; can etch features as small as 90 nm on nitride and oxide hard masks. | plasmatherm.com[1] |
| 6520 | — | — | Can etch aluminum alloys down to the sub-micron level; includes a rinse-strip-rinse procedure; useful for aluminum alloy interconnects and metallization layers; can anisotropically etch thick layers greater than 2 microns. | plasmatherm.com[1] |
| 6540 | — | — | Designed for high dielectric coefficient materials, platinum and iridium electrodes, gold interconnects, and other difficult-to-etch materials including PZT, SBT, and BST; features as small as 90 nm can be etched. | plasmatherm.com[1] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of plasma architecture does the Tegal 6500 HRe- use?
The Tegal 6500 HRe- uses dual frequencies for high-density, capacitively coupled plasma generation and magnetic plasma confinement.[1]
How many etching chambers can the Tegal 6500 HRe- be configured with?
The Tegal 6500 HRe- can be configured with one or two etching chambers.[1]
Can the Tegal 6500 HRe- process wafers in serial or parallel mode?
The Tegal 6500 HRe- can be programmed to perform serial or parallel wafer processing.[1]
What loading-port configurations are supported?
The Tegal 6500 HRe- supports single or dual loading ports, depending on configuration and application.[1]
Not publicly documented
The following facts about the 6500 HRe- are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6500 HRe- are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 6500 HRe- are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 6500 HRe- are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 6500 HRe- is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 6500 HRe- are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]plasmatherm.com — plasmatherm.complasmatherm.com
Last updated Oct 3, 2026.
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