STS
MXP Multiplex ICP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The STS MXP Multiplex ICP is an inductively coupled plasma etcher. The STS MXP Multiplex ICP is a plasma etch tool. The STS MXP Multiplex ICP is in the Etch category.[1][2]
What it is
How it works
The STS MXP Multiplex ICP is an etch tool rather than a deposition tool, and the class is used for plasma etching.[1][2]
Where it fits in the process flow
Applications
What do the numbers mean?
Configuration & options7
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MXP Multiplex ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MXP Multiplex ICP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MXP Multiplex ICP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MXP Multiplex ICP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MXP Multiplex ICP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MXP Multiplex ICP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Inventory photo
- [4]Surface Technology Systems (STS) MXP Multiplex ICP ASE HR — wotol.comwotol.com
- [5]Surface Technology Systems (STS) MXP Multiplex ICP HR — wotol.comwotol.com
- [6]MXP Multiplex ICP ASE HR SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER | SemiStar — semistarcorp.comsemistarcorp.com
Last updated Oct 9, 2026.
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