Waferpedia

Plasma-Therm

Versaline VLN ICP

Versaline VLN ICP — Inventory photo
Fig. 01Versaline VLN ICPInventory photo[1]

Wafer size

Brooks TM (Transfer Module) with four Wafer Manual Load Lock

Power

208V, 60 Hz, 3 phase[1]

Vacuum

No pumps or chiller included[1]

What it is

The Plasma-Therm Versaline VLN ICP is a plasma etch system.[1][2][4]

The Plasma-Therm Versaline VLN ICP uses inductively coupled plasma in an etch application.[1][2]

How it works

The Plasma-Therm Versaline VLN ICP has a single ICP chamber and a manual load lock for single or multiple wafers.[1][2]

The Plasma-Therm Versaline VLN ICP includes RF power delivery, gas flow control, pressure control, vacuum pumping, backside cooling, a chamber heater, and a Windows based operating system.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

Plasma etch tools sit in the pattern transfer part of semiconductor processing and act after lithography has defined features in a masking layer.

Plasma etch tools are used before downstream cleaning, inspection, and later process modules that follow feature transfer into the wafer.

Applications

The Plasma-Therm Versaline VLN ICP is used for wafer etching in semiconductor manufacturing.[1][2][4]

The Plasma-Therm Versaline VLN ICP is configured with gas delivery, backside cooling, temperature control, and vacuum subsystems that support process tuning during etch.[1][2][4]

What do the numbers mean?

Power & electrical6

ENI ACG-6B RF Power Supply – 600W @ 13.56MHz with Seren AT6NVL Matchwork & MC2 Tunner[1]
Accurate?
ENI GMW-25A RF Power Supply – 2500W @2.0MHz with Seren AT25NVL Matchwork & MC2 Tunner[1]
Accurate?
Voltage
208V, 60 Hz, 3 phase[1]
Accurate?
RF power supply 1
ENI ACG-6B RF Power Supply – 600W @ 13.56MHz with Seren AT6NVL Matchwork & MC2 Tunner[1]
Accurate?
RF power supply 2
ENI GMW-25A RF Power Supply – 2500W @2.0MHz with Seren AT25NVL Matchwork & MC2 Tunner[1]
Accurate?
Electrical
208V, 60 Hz, 3 phase[1]
Accurate?

Vacuum & pumping5

VAT PM5 Pressure Controller with Leybold Turbo pump[1]
Accurate?
Seiko Seiki 1303CV Turbo Pump with Seiko Seiki SCU 750 controller[1]
Accurate?
No pumps or chiller included[1]
Accurate?
Pressure controller
VAT PM5 Pressure Controller with Leybold Turbo pump[2]
Accurate?
Turbo pump
Seiko Seiki 1303CV Turbo Pump with Seiko Seiki SCU 750 controller[2]
Accurate?

Wafer handling3

Manual Load Lock for Single or Multiple Wafers[1]
Accurate?
Wafer size
Brooks TM (Transfer Module) with four Wafer Manual Load Lock[2]
Accurate?
Wafer handling
Manual load lock for single or multiple wafers[1]
Accurate?

Gas & chemistry4

(5) MFCs-gas with Isolation, Process and By-pass valves[1]
Accurate?
(6) MFCs-gas with Isolation, Process and By-pass valves[2]
Accurate?
Gas handling
(5) MFCs-gas with Isolation, Process and By-pass valves[1]
Accurate?
Gas handling
(6) MFCs-gas with Isolation, Process and By-pass valves[2]
Accurate?

Control & software4

VAT Gate Valve and controller[1]
Accurate?
Watlow chamber heater and controller[1]
Accurate?
Chamber heater
Watlow chamber heater and controller[1]
Accurate?
Control software
Windows Based OS[1]
Accurate?

Configuration & options10

Single ICP Chamber[1]
Accurate?
He Backside Cooling[1]
Accurate?
Windows Based OS[1]
Accurate?
Inter Cal Gate Valve[2]
Accurate?
Manufacturer
Plasma-Therm[1]
Accurate?
Model
Versaline VLN ICP[1]
Accurate?
Category
Etch[4]
Accurate?
Process type
Inductively coupled plasma[1]
Accurate?
Chamber
Single ICP chamber[2]
Accurate?
Backside cooling
He Backside Cooling[1]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationENI ACG-6B RF Power Supply – 600W @ 13.56MHz with Seren AT6NVL Matchwork & MC2 Tunner[1]
  • ConfigurationENI GMW-25A RF Power Supply – 2500W @2.0MHz with Seren AT25NVL Matchwork & MC2 Tunner[1]
  • ConfigurationVAT PM5 Pressure Controller with Leybold Turbo pump[1]
  • ConfigurationSeiko Seiki 1303CV Turbo Pump with Seiko Seiki SCU 750 controller[1]
  • Configuration(5) MFCs-gas with Isolation, Process and By-pass valves[1]
  • Voltage208V, 60 Hz, 3 phase[1]
  • ConfigurationNo pumps or chiller included[1]
  • Configuration(6) MFCs-gas with Isolation, Process and By-pass valves[2]
  • RF power supply 1ENI ACG-6B RF Power Supply – 600W @ 13.56MHz with Seren AT6NVL Matchwork & MC2 Tunner[1]
  • RF power supply 2ENI GMW-25A RF Power Supply – 2500W @2.0MHz with Seren AT25NVL Matchwork & MC2 Tunner[1]
  • Pressure controllerVAT PM5 Pressure Controller with Leybold Turbo pump[2]
  • Turbo pumpSeiko Seiki 1303CV Turbo Pump with Seiko Seiki SCU 750 controller[2]
  • Gas handling(5) MFCs-gas with Isolation, Process and By-pass valves[1]
  • Gas handling(6) MFCs-gas with Isolation, Process and By-pass valves[2]
  • Electrical208V, 60 Hz, 3 phase[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What chamber configuration does the Plasma-Therm Versaline VLN ICP use?

The Plasma-Therm Versaline VLN ICP has a single ICP chamber.[1][2]

Not publicly documented

The following facts about the Versaline VLN ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Versaline VLN ICP are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Versaline VLN ICP are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Versaline VLN ICP are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Versaline VLN ICP are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Versaline VLN ICP is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]waferpedia.com — waferpedia.comwaferpedia.com
Was this page accurate?

Last updated Oct 7, 2026.

Compare with similar tools

View all →