Waferpedia

Plasma-Therm

Versaline LACVD

EtchPlasma-Therm Versaline family
Research Quality: 30% complete
Versaline LACVD — Inventory photo
Fig. 01Versaline LACVDInventory photo[1]

Power

CCP source 13.56 MHz up to 600 W[1]

Gas delivery

CF4 (84 sccm)[1]

What is it?

The Plasma-Therm Versaline LACVD is an etch system for 6-inch wafers.

What do the numbers mean?

Power & electrical2

ICP source 2 MHz up to 2000 W with temperature control[1]
Accurate?
CCP source 13.56 MHz up to 600 W[1]
Accurate?

Vacuum & pumping1

thermally managed chamber liner and pump train[1]
Accurate?

Wafer handling2

2x loadlock Ports[1]
Accurate?
Substrate temperature control via bipolar Johnsen-Rahbek electrostatic chuck[1]
Accurate?

Gas & chemistry8

Gases and maximum flows in positions 1 to 8 respectively are:[1]
Accurate?
CF4 (84 sccm)[1]
Accurate?
O2 (1000 sccm)[1]
Accurate?
Ar (50 sccm)[1]
Accurate?
O2 (50 sccm)[1]
Accurate?
CHF3 (100 sccm)[1]
Accurate?
N2 (200 sccm)[1]
Accurate?
H2 (100 sccm)[1]
Accurate?

Control & software3

Operating system
Windows 7 Professional SP1 OS[1]
Accurate?
Tool software
Plasma-Therm Cortex[1]
Accurate?
OES Software
Plasma-Therm EndpointWorks[1]
Accurate?

Configuration & options4

2x Process Chambers[1]
Accurate?
DMC / OCR Reader[1]
Accurate?
He (50sccm)[1]
Accurate?
With backside Helium cooling[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationGases and maximum flows in positions 1 to 8 respectively are:[1]
  • ConfigurationCF4 (84 sccm)[1]
  • ConfigurationO2 (1000 sccm)[1]
  • ConfigurationAr (50 sccm)[1]
  • ConfigurationO2 (50 sccm)[1]
  • ConfigurationCHF3 (100 sccm)[1]
  • ConfigurationN2 (200 sccm)[1]
  • ConfigurationH2 (100 sccm)[1]
  • ConfigurationICP source 2 MHz up to 2000 W with temperature control[1]
  • ConfigurationCCP source 13.56 MHz up to 600 W[1]
  • Configurationthermally managed chamber liner and pump train[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Versaline LACVD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Versaline LACVD are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Versaline LACVD are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Versaline LACVD are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Versaline LACVD are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Versaline LACVD is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
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Last updated Jul 29, 2026.

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