Nanometrics
The Nanometrics 210 measures film thickness over a range from one hundred to five hundred thousand angstroms. The Nanometrics 210 has a typical measurement time of two and a half seconds. The Nanometrics 210 uses spot sizes of fifty micrometers with a five times objective, twenty five micrometers with a ten times objective, and six point five micrometers with a forty times objective. The Nanometrics 210 measures oxide on silicon, nitride on silicon, negative resist on silicon, polysilicon on oxide, negative resist on oxide, nitride on oxide, polyimide on silicon, positive resist on silicon, and positive resist on oxide. The Nanometrics 210 operates in reflectance mode for thick films. The Nanometrics 210 has a reproducibility of five angstroms plus or minus five percent depending upon film type.[3]
The Nanometrics 210 measures oxide, nitride, resist, polysilicon, and polyimide films on silicon and oxide substrates.[3]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Nanometrics 210 XP | — | — | Listed as a scanning UV Nanospec/DUV microspectrophotometer. | nanolab.berkeley.edu[2] |
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The Nanometrics 210 has a typical measurement time of two and a half seconds.[3]
The Nanometrics 210 measures oxide on silicon, nitride on silicon, negative resist on silicon, polysilicon on oxide, negative resist on oxide, nitride on oxide, polyimide on silicon, positive resist on silicon, and positive resist on oxide.[3]
The Nanometrics 210 operates in reflectance mode for thick films.[3]
The following facts about the 210 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 210 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 210 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 210 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 210 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 210 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 5, 2026.