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Hitachi

M 712 M 711 Dry Etch Process

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Power

DAIHEN ES7-IIA EC Source generator[2]

Gas delivery

Gas configuration:[2]

What is it?

What do the numbers mean?

Power & electrical2

DAIHEN ES7-IIA EC Source generator[2]
Accurate?
PEARL CF-500-400K EC Bias generator[2]
Accurate?

Gas & chemistry1

Gas configuration:[2]
Accurate?

Control & software2

Software revision
1.07 PMv.02.16M[1]
Accurate?
3203LMC-K1 EC TMP Controller[2]
Accurate?

Configuration & options16

Gaspanel included[1]
Accurate?
ESC Type
Bipolar[2]
Accurate?
Endpoint type
Hitachi EPD monitor ePMv02.16M[2]
Accurate?
SHIMAZU EC TMP[2]
Accurate?
Line / EC1 / Strip[2]
Accurate?
1 / Ar[2]
Accurate?
2 / C12[2]
Accurate?
3 / SF6[2]
Accurate?
4 / HBr[2]
Accurate?
5 / CF3[2]
Accurate?
6 / CH4[2]
Accurate?
7 / NF3[2]
Accurate?
8 / O2[2]
Accurate?
9 / N2[2]
Accurate?
10/ SF6[2]
Accurate?
11/ C12[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationDAIHEN ES7-IIA EC Source generator[2]
  • ConfigurationPEARL CF-500-400K EC Bias generator[2]
  • ConfigurationGas configuration:[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the M 712 M 711 Dry Etch Process are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the M 712 M 711 Dry Etch Process are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the M 712 M 711 Dry Etch Process are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the M 712 M 711 Dry Etch Process are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the M 712 M 711 Dry Etch Process are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the M 712 M 711 Dry Etch Process is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
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Last updated Jul 29, 2026.

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