Hitachi
Kokusai KV J 888
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedThe Hitachi Kokusai KV J 888 is a chemical vapor deposition (CVD) system used in semiconductor manufacturing. The system is designed for depositing thin films onto substrates through chemical reactions of precursor gases.
How it works
General reference — not yet source-verifiedChemical vapor deposition systems operate by introducing one or more volatile precursor gases into a reaction chamber where they decompose and react on the heated wafer surface to form a solid thin film. The reaction can be thermally driven or plasma-enhanced, depending on the specific process requirements. Byproducts and excess gases are removed from the chamber through a vacuum or exhaust system.
What do the numbers mean?
Wafer handling1
Gas & chemistry1
Configuration & options4
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Process typeCVD (Chemical Vapor Deposition)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the manufacturer of the KV J 888?
The manufacturer is Hitachi Kokusai.[1]
Not publicly documented
The following facts about the Kokusai KV J 888 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Kokusai KV J 888 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Kokusai KV J 888 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Kokusai KV J 888 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Kokusai KV J 888 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Kokusai KV J 888 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Sep 27, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.