ASML
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The ASML PAS 5500/60 is a sub-half-micron i-line stepper. The ASML PAS 5500/60 processes 200 mm wafers with 450 nm resolution. The ASML PAS 5500/60 uses a 365 nm near-UV light source.[1][2]
The ASML PAS 5500 / 60 is a step-and-repeat i-line stepper system used in semiconductor photolithography.[2]
The machine delivers throughputs up to 48 eight-inch wafers per hour.[2]
Documented failure modes, common issues, and field considerations.
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The system delivers throughputs up to 48 eight-inch wafers per hour.[2]
The following facts about the PAS 5500 60 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PAS 5500 60 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the PAS 5500 60 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PAS 5500 60 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the PAS 5500 60 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PAS 5500 60 are on record.
Answerable by: an OEM parts catalog or a service engineer
Last updated Sep 25, 2026.