Applied Materials
E 500 HP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials / Varian E 500 HP is an 8-inch medium current ion implanter.[1]
What it is
The Applied Materials / Varian E 500 HP is a medium-current ion implanter designed for 8-inch wafers.[1]
How it works
General reference — not yet source-verifiedAn ion implanter generates ions from a feed gas, accelerates them, and mass-selects a specific dopant species before scanning the beam across the wafer target.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation follows photolithographic patterning, where a resist mask defines regions to be doped.
After implantation, wafers undergo a high-temperature anneal to activate the dopants and repair crystal damage.
Applications
General reference — not yet source-verifiedMedium-current implanters like the E 500 HP are used for threshold voltage adjustment, channel doping, and lightly doped drain (LDD) formations.
What do the numbers mean?
Wafer handling1
Configuration & options2
- Medium Current[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Varian EHPI E 220— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian EHPI 500— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian Viision 200— Same function class: Ion Implantation, nullCompare in depthsource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Is the E 500 HP a high-current or medium-current implanter?
The E 500 HP is a medium-current implanter.[1]
Not publicly documented
The following facts about the E 500 HP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the E 500 HP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the E 500 HP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the E 500 HP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the E 500 HP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the E 500 HP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]inventory listing
Last updated Sep 22, 2026.
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The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.