Applied Materials
E 500 EHPI Medium Current
The Applied Materials E 500 EHPI Medium Current is a medium current ion implanter. The Applied Materials E 500 EHPI Medium Current processes 6 inch wafers.[1][2]
What it is
How it works
The E 500 EHPI uses a beamline architecture with an analyzing magnet, a solid-state scanner for fast beam deflection, and a series of turbo pumps and cryo pumps to maintain vacuum. The machine includes a reverting source magnet and a beam energy probe for energy verification. Beam purity check software and fast parametric software are available to monitor and control the implant process.[1][2]
What do the numbers mean?
Vacuum & pumping8
Wafer handling5
Gas & chemistry1
Control & software5
Configuration & options16
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Axcelis NV 8250— Same function class: Ion Implantation, UnknownCompare in depthsource[3]
- Axcelis NV 8250 HT Ion— Same function class: Ion Implantation, UnknownCompare in depthsource[4]
- Varian EHPI 500— Same function class: Ion Implantation, nullCompare in depthsource[5]
- Varian Viision 80— Same function class: Ion Implantation, nullCompare in depthsource[6]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What are the typical maintenance requirements for a medium-current implanter?General reference — not yet source-verified
Routine maintenance includes replacing ion source components (filaments, chambers), cleaning and aligning beamline optics, servicing vacuum pumps, and calibrating dose monitors. Endstation parts, such as wafer handling robots and scanning mechanisms, also require periodic inspection. System uptime depends on proactive management of these consumables.
Is a medium-current implanter suitable for both production and R&D environments?General reference — not yet source-verified
Yes. In production, these tools are used for mainstream CMOS logic and memory manufacturing where moderate doses are needed. In R&D, they provide the flexibility to adjust dose and energy across a useful range for process development and device characterization, though dedicated engineering tools may be preferred for extreme conditions.
Not publicly documented
The following facts about the E 500 EHPI Medium Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the E 500 EHPI Medium Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the E 500 EHPI Medium Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the E 500 EHPI Medium Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the E 500 EHPI Medium Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the E 500 EHPI Medium Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]Equipment inventory listing
- [5]patents.google.compatents.google.com
- [6]web.archive.orgweb.archive.org
Last updated Oct 11, 2026.
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The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
The Axcelis NV 8250 is an ion implanter for 8-inch wafer processing with an energy range of 0-250 keV.
Axcelis NV 8250 HT Ion Implanter is an 8-inch ion implanter with listed power and vacuum-related configuration details.
The Varian Viision 80 is an ion implanter described as a medium-current system for 8-inch wafers.