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Applied Materials

Centura 5200 HTF RP EPI

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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What is it?

Applications

The Centura 5200 HTF RP EPI is used for reduced-pressure epitaxial silicon deposition. The model is suited to semiconductor wafer processing that requires crystalline silicon film growth.[1]

What do the numbers mean?

Vacuum & pumping1

Process Type
Reduced Pressure Epitaxial Silicon Deposition[1]
Accurate?

Configuration & options4

3 Chamber[1]
Accurate?
Refurbished[1]
Accurate?
Number of Chambers
3[1]
Accurate?
Condition
Refurbished[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Process TypeReduced Pressure Epitaxial Silicon Deposition[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Centura 5200 HTF RP EPI are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 HTF RP EPI are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Centura 5200 HTF RP EPI are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Centura 5200 HTF RP EPI are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Centura 5200 HTF RP EPI are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Centura 5200 HTF RP EPI is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing
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Last updated Oct 7, 2026.

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