Oxford Instruments PlasmaPro NGP 1000

Models in this family

1. 

   PlasmaPro NGP 1000

   Oxford Instruments PlasmaPro NGP 1000 is a PECVD system described as capable of running up to 450 mm wafers.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PlasmaPro NGP1000 ICP 380	—	2013	Etch version with ICP source (5kW, 2MHz RF), 3000W 13.56MHz RF for RIE, different turbo pump and dry pumps, different gas configuration (BCL3, N2, CL2, HBr, SF6, CF4, Ar, O2), mechanical wafer clamping, optical endpoint detector.	classoneequipment.com[1]
   Oxford PlasmaPro NGP1000 ICP 380	—	2013	Etch version with ICP source, 5kW 2MHz RF, 3000W 13.56MHz RF for RIE, different turbo pump and dry pumps, different gas configuration, mechanical wafer clamping, and optical endpoint detector.	classoneequipment.com[1]

Sources