Waferpedia

Tool family

Oxford Instruments Plasmalab 80

Models in this family

  1. Oxford Instruments Plasmalab 80+ is a compact open-loading reactive ion etch system for R&D or small-scale production.

  2. Oxford Instruments Plasmalab 80 Plus RIE is a reactive ion etcher with support for wafers up to 8 inches.

  3. The Oxford Instruments Plasmalab 80 Plus RIE-PECVD is a dual-chamber reactive ion etcher and plasma-enhanced chemical vapor deposition system.

  4. Oxford Instruments Plasmalab 80 uP RIE is a reactive ion etcher that was mainly used for O2 plasma processing and includes a vacuum pump.

All entries

  1. Plasmalab 80 PlusOxford Instruments

    Oxford Instruments Plasmalab 80+ is a compact open-loading reactive ion etch system for R&D or small-scale production.

    CategoryEtchWafer200mm
    24 specs
  2. Plasmalab 80 Plus RIEOxford Instruments

    Oxford Instruments Plasmalab 80 Plus RIE is a reactive ion etcher with support for wafers up to 8 inches.

    CategoryEtchWafer8"
    31 specs
  3. Plasmalab 80 Plus RIE-PECVDOxford Instruments

    The Oxford Instruments Plasmalab 80 Plus RIE-PECVD is a dual-chamber reactive ion etcher and plasma-enhanced chemical vapor deposition system.

    CategoryEtch
    5 specs
  4. Plasmalab 80 uP RIEOxford Instruments

    Oxford Instruments Plasmalab 80 uP RIE is a reactive ion etcher that was mainly used for O2 plasma processing and includes a vacuum pump.

    CategoryEtch
    3 specs