Tool family
The TWINSCAN EXE:5200B is a dual-stage extreme ultraviolet (EUV) lithography system designed to support volume production of sub-2 nm Logic nodes and leading-edge DRAM nodes.
The TWINSCAN EXE:5200B is a dual-stage extreme ultraviolet (EUV) lithography system designed to support volume production of sub-2 nm Logic nodes and leading-edge DRAM nodes.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| TWINSCAN EXE:5000 | High NA | — | First in the EXE generation; supports advanced Logic and Memory chip production. | asml.com[1] |