Waferpedia

Comparison ledger

0332 F 9453 302 DiffusionversusPB8

Varian 0332 F 9453 302 Diffusion, YES PB8, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
PB8YES
OEMVarianYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size—Up to 8-inch wafers
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 0332 F 9453 302 DiffusionYES PB8
Cited variants—
  • YES-PB8 High Vac[1]
  • YES-PB8 High Vac Specs[1]
  • PB12[1]
Specifications
Asset Number142841[2]—
Last Confirm DateOctober 14, 2025[3]—
Capacity—Up to two boats of 8-inch wafers[4]
Ramp rate—1-5°C/min[4]
Cool-down rate—1-5°C/min[4]
Max temperature—450°C[4]
Idle temperature—50°C[4]
Gas/material compatibility—Non-toxic and non-flammable gases/materials only[4]
Vacuum level—High vacuum; tool overview states 10^-5 Torr[1]
Wafer size support—Up to 200mm wafers[1]
Load type—Manual load[1]
Process atmosphere—Filtered heated nitrogen purging the chamber in a laminar flow[4]
Compatibility—4 - Glass and Metal; no low-temperature materials unstable below 500C; no high-vapor-pressure materials; non-toxic and non-flammable gases/materials only[4]
Series vacuum level—High vacuum (10^-5)[1]
Operating temperatures for wafer dehydration—150°C to 450°C[1]
Laminar flow pressure range—0.50-500 Torr[1]
Evacuation capability—Down to 1E-5 Torr using a vacuum turbo pump[1]
Cooling package—Uses air only, no water[1]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]Equipment inventory listing
  3. [3]fab-spares.comfab-spares.com
  4. [4]cnfusers.cornell.educnfusers.cornell.edu