Comparison ledger
Tegal 1512e, Veeco RF 350 Ion Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1512eTegal | RF 350 Ion BeamVeeco |
|---|---|---|
| OEM | Tegal | Veeco |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tegal 1512e | Veeco RF 350 Ion Beam |
| Specifications | ||
| Tool type | Industrial RIE plasma etcher system[1] | Ion Beam Etcher (IBE)[3] |
| Stated configuration | With modules assembly for CI-4222[1] | — |
| Ion Source Diameter | — | 300 mm[2] |
| Ion Source Type | — | inductively coupled, filamentless RF[2] |
| Wafer Size | — | single 6" (150 mm)[2] |
| Substrate Loading | — | single-substrate loadlocked (or configurable to cassette-to-cassette)[2] |
| OEM | — | Veeco[3] |
| Model | — | RF 350[3] |
| Category | — | Etch[4] |
| Process modes | — | Ion Beam Etching (IBE) and Reactive Ion Beam Etching (RIBE)[2] |
| Ion source type | — | inductively coupled, filamentless RF ion source[4] |
| Loading | — | single 6" wafer loading[2] |
| Applications | — | MEMS, semiconductor fabrication, and data storage[2] |
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