Comparison ledger
Semitool ST 2700 Dual Stack Spin Rinse, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ST 2700 Dual Stack Spin RinseSemitool | 1000FPYES |
|---|---|---|
| OEM | Semitool | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool ST 2700 Dual Stack Spin Rinse | YES 1000FP |
| Specifications | ||
| Tool type | Dual Stack Spin Rinse Dryer (SRD)[1] | — |
| Upper unit substrate size | 100mm (4")[2] | — |
| Lower unit substrate size | 150mm (6")[2] | — |
| Rinse RPM | around 600[2] | — |
| Dry RPM | 1200[2] | — |
| Minimum recommended dry time | 240s[2] | — |
| System type | — | Plasma cleaning system[3] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[3] |
| Model | — | Glen/YES 1000FP[3] |
| Designed use | — | Designed to accept a range of shelf sizes[3] |
| Application focus | — | Changing needs of the flat panel industry[3] |
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