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11600 SRDversusClean Track Act 8 Resist

Semitool 11600 SRD, Tokyo Electron Clean Track Act 8 Resist, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
Clean Track Act 8 ResistTokyo Electron
OEMSemitoolTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Vintage year
Control system——
Generation——
FamilySemitool 11600 SRDTokyo Electron Clean Track
Cited variants—
  • 8" Single Block[1]
  • 8" Multi Block[2]
  • 6" Single Block[3]
  • Single Block[1]
  • Multi Block[2]
  • Clean Track Act 8 (Single Block)[1]
  • Clean Track Act 8 (Multi Block)[2]
  • Clean Track Act 8 (8 inch, Single Block)[1]
  • Clean Track Act 8 (8 inch, Multi Block)[2]
  • Clean Track Act 8 (6 inch, Single Block)[3]
Specifications
ConfigurationCeramic[4]Single Block[1]
ManufacturerSemitool[4]Tokyo Electron[1]
Model11600 SRD[4]Clean Track Act 8[1]
Equipment typeSpin Rinse Dryer[4]Resist coater/developer[1]
System—Right to Left[5]
Main robot—3 Pincette Arm[5]
Type—Resist Coater / Developer[1]
Wafer Sizes—6 inch, 8 inch[3]
Supported wafer sizes—6 inch, 8 inch[1]
Supported Wafer Size—8 inch[1]
11600 SRD entryClean Track Act 8 Resist entryAsk about these tools →Share experience with this comparison →

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Sources (6)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]inventory listing
  5. [5]inventory listing
  6. [6]Equipment inventory listing