Comparison ledger
Semitool 003163-000 SRD, Semitool 421 Scepter Spray Solvent, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 003163-000 SRDSemitool | 421 Scepter Spray SolventSemitool |
|---|---|---|
| OEM | Semitool | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | Batch Solvent Processor for Wafer Cleaning |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool 003163-000 SRD | Semitool 421 |
| Cited variants | — |
|
| Specifications | ||
| Make | Semitool[2] | — |
| Model | 003163-000[2] | — |
| Equipment type | Spin Rinse Dryer (SRD)[2] | — |
| Asset # | 139375[2] | — |
| Last Confirm Date | September 03, 2025[2] | — |
| Wafer size | — | Batch Solvent Processor for Wafer Cleaning[3] |
| Configuration | — | Max Substrate Size of 8”/200mm[3] |
| Maximum substrate size | — | 200 mm (8 inch)[3] |
| Batch capacity | — | Up to 50 wafers[4] |
| Chamber type | — | Single chamber[4] |
| Automation level | — | Semi-automated[4] |
| Number of tanks | — | 4 stainless steel (2 heated, 2 ambient)[5] |
| Process applications | — | Polymer removal, resist stripping, wafer cleaning, metal lift-off[5] |
| OEM model number | — | SST-421[5] |
| Also known as | — | Scepter Spray Solvent Tool (SST)[3] |
| Maximum wafer count per batch | — | 50 wafers[3] |
| Number of heated tanks | — | 2[5] |
| Rotor included | — | 1 rotor (select size at time of order)[5] |
| Touch screen | — | Class 1 Touch Screen Monitor[1] |
| Pumps | — | Pneumatic pumps, Trebor 610 back[1] |
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