Comparison ledger
Nikon NSR SF 155 i-Line, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR SF 155 i-LineNikon | 1000 FamilyUltratech |
|---|---|---|
| OEM | Nikon | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR | Ultratech 1000 Family |
| Specifications | ||
| Configuration | SMIF / FOUP[1] | — |
| Load Module | SEMES EFEM[1] | — |
| Nikon Lens | SRI 12 M 4 IL 2 SS[1] | — |
| Reticle Size | 6 inch[1] | — |
| Wafer Type | Notch[1] | — |
| Inline Flow | In-Line[1] | — |
| Alignment System | FIA Modification for Colored Resist[1] | — |
| WL Type | 12 inch[1] | — |
| Mercury Lamp | 7.5 KW (SUV 7500 NI)[1] | — |
| LLTC TeompSetting | 23 Deg C[1] | — |
| Exposure Wavelength | i-line (365 nm)[2] | — |
| Light Source | Mercury lamp[2] | — |
| Reduction Ratio | 5×[2] | — |
| Resolution | ≥0.5 µm[2] | — |
| Wafer Sizes (standard) | 150 mm (6 inch) and 200 mm (8 inch)[2] | — |
| Stage System | Precision XY wafer stage with closed-loop positioning[2] | — |
| Operating System | Windows[1] | — |
| PM1 | UV Lamp[1] | — |
| PM2 | Stage[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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