Waferpedia

Comparison ledger

1 DP 41versusCP3000

Logitech 1 DP 41, Logitech CP3000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1 DP 41Logitech
CP3000Logitech
OEMLogitechLogitech
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLogitech 1 DP 41Logitech CP3000
Specifications
Phase3 Phase[1]—
Configuration50/60 Hz[1]—
Voltage480 V[1]230V ± 10% 50 Hz[2]
MakeLogitech[1]—
Model1 DP 41[1]—
Frequency50/60 Hz[1]—
Current12 amps[1]—
Recommended use—Ideal for use with a Logitech CP3000 Chemical Polishing Machine[2]
Cabinet model—1CP3AC-0100[2]
Construction—Steel protected with an anti-acid polyethylene coating[2]
Transparent elements—Acrylic panels[2]
Temperature range—15°C to 32°C[2]
Humidity—Max RH 80% for temperatures up to 31°C[2]
Filter type—OS 4 Pre-Filter 1; Organic Vapours Secondary acids Enviro Carbon Filter (OS); Acid Vapours Secondary Organic acids Enviro Carbon Filter (H+)[2]
Volume of air—130 m3/hr[2]
Face velocity—>0.5 m/s[2]
Fan type—EBM R2E-190-AO26-05 230V 50Hz dynamically balanced centrifugal[2]
Opening type—Teardrop[2]
Power consumption—45 Watts[2]
Supply amps—5.0[2]
Airflow alarm—AMS programmable electronic with audible as an option[2]
Lighting—Integrated lighting up to 19W, available as an option[2]
Sound level—< 50 dBA at 1 metre[2]
Net weight—75 kg[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org