Waferpedia

Comparison ledger

SEZ SP 203versusSEZ SP 203 Spin

Lam Research SEZ SP 203, Lam Research SEZ SP 203 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SEZ SP 203Lam Research
SEZ SP 203 SpinLam Research
OEMLam ResearchLam Research
CategoryWet Processing / CleanEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1998 Vintage—
Control system——
Generation——
FamilyLam Research SEZ SP 203Lam Research SEZ SP 203
Cited variants
  • SEZ SP 203 Spin[1]
—
Specifications
Configuration200-208 V[2]50/60 Hz[4]
Phase3 Phase[2]ENI VL-400 Phase Shift Controller[5]
Pinless chuck6 Inch[2]—
SoftwareMajor Version 117[2]—
Cabinet 1Main tank and Buffer tank[2]—
Cabinet 2Main tank and Buffer tank[2]—
Cabinet 3Main tank[2]—
ModificationsFFU controller; 1 cabinet drain box repaired[2]—
ManufacturerLam Research[3]—
CategoryWet Processing / Clean[3]Etch[1]
Wafer size6 inch[2]150mm[6]
Power200-208 V[2]400V, 50 Hz, 3-Phase[5]
Frequency50/60 Hz[2]—
Wafer handling6 Inch Bernoulli Handling[2]—
ChuckPinless chuck: 6 Inch[2]—
Vacuum exhaustExhaust Up[3]—
Chemistry cabinets3 Chemistry Cabinets[3]—
Software major version117[2]—
Software minor version2015.08.21[2]—
GEM versionGEM 5.8[2]—
Known problemsKeyboard switching; Voltage fluctuations[2]—
Voltage—400 VAC[4]
Max. Current—32 A[4]
Breaking Capacity—10.000 AIC[4]
Roughing Pump Code—A532-80-905[5]
OEM—Lam Research[1]
Model—SEZ SP 203 Spin[4]
Tool type—Spin etcher[1]
Vintage—1999[6]
Process pump status—Process pump in one chemical cabinet (sub tool) has malfunction[4]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing
  5. [5]inventory listing
  6. [6]csisemi.comcsisemi.com