Waferpedia

Comparison ledger

Exelan Dryversus1512e

Lam Research Exelan Dry, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Exelan DryLam Research
1512eTegal
OEMLam ResearchTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research Exelan DryTegal 1512e
Cited variants—
Specifications
Wafer Size300mm[1]—
Vintage (manufacturing year)2005[1]—
Wafer Size (via version)200mm[3]—
Vintage2004-06-01[2]—
ManufacturerLam Research[4]—
ModelExelan Dry[4]—
Tool typedry etch chamber[5]Industrial RIE plasma etcher system[6]
Vintage year2005[5]—
Variant designationV2 Exelan[5]—
Variant wafer size200mm[5]—
Variant vintage year2004[5]—
Stated configuration—With modules assembly for CI-4222[6]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (6)Every fact above is drawn from these public sources
  1. [1]csisemi.comcsisemi.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]fabsurplus.comfabsurplus.com
  4. [4]Equipment inventory listing
  5. [5]waferpedia.comwaferpedia.com
  6. [6]semistarcorp.comsemistarcorp.com