Comparison ledger
KLA RS 75 Sheet Resistance Measurement, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | KLA | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA RS 75 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 115 Volts[1] | — |
| Measurement Range | 5 mΩ/sq - 5 MΩ/sq[2] | — |
| Repeatability (VLSI) | < 0.2% (1σ)[2] | — |
| Accuracy (VLSI) | ±1%[2] | — |
| Edge Exclusion | 3 mm from edge of film[2] | — |
| Throughput (5-site) | 100 WPH[2] | — |
| Alignment System | Notch/Flat aligner on Probe Arm[2] | — |
| Computer OS | DOS Software: Rev 6.22[2] | — |
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