Comparison ledger
Gaertner MI108E, KLA .498 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MI108EGaertner | |
|---|---|---|
| OEM | Gaertner | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Gaertner MI108E | KLA .498 PSL Wafer |
| Specifications | ||
| Objective magnification | 3.48X[1] | — |
| Eyepiece magnification | 10X[1] | — |
| Total magnification | 34.8X[1] | — |
| Optical working distance | 41.2 mm[1] | — |
| Micrometer drum resolution | 0.0001 mm or 0.00001 in per division[1] | — |
| Standard equipment | Base, filtered light source, fixed slit, filar micrometer eyepiece M202E, x-y positioning stage with .001 reading micrometer thimbles, fixed angular mount, and vertical positioning stage[1] | — |
| Configuration | — | NIST Traceable[2] |
| NIST traceability | — | Yes[2] |
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