Comparison ledger
Filmetrics F10-RT, KLA Flexus F 2320 I Stress Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | F10-RTFilmetrics | |
|---|---|---|
| OEM | Filmetrics | KLA |
| Category | — | — |
| Wafer size | 6" | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1991 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Filmetrics F10-RT | KLA Flexus F 2320 I Stress Measurement |
| Specifications | ||
| Instrument type | optical spectrometer[1] | — |
| Use in source example | measured reflectivity of a 9-period SiO2/Ta2O5 DBR[2] | — |
| Example measurement wavelength | high reflectivity at approximately 1050 nm[2] | — |
| Alternate name | F10RT[1] | — |
| Measurement capability | Reflectivity[2] | — |
| Configuration | — | Dual Wavelength[3] |
| Software Version | — | 2.0[3] |
| Operating System | — | MS-DOS V6.22[3] |
| Voltage | — | 115V[3] |
| Current | — | 10A[3] |
| Wafer size | — | This system comes with an alignment/centering ring for a 6" wafer[3] |
| Wafer Sizes | — | 6 inch, 8 inch[3] |
| Vintage | — | 1991[3] |
| Measurement | — | Dual Wavelength[3] |