Comparison ledger
EV Group 101, Nikon NSR S 208 D KrF, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | NSR S 208 D KrFNikon |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2004 Introduction |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon NSR S 208 |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | NSR S 208 D[6] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Configuration | — | 110nm[4] |
| Resolution | — | 110 nm[5] |
| Numerical aperture (NA) | — | 0.82[5] |
| Wafer size | — | 200/300 mm[5] |
| Reduction factor | — | 4x[5] |
| Exposure field | — | 26 x 33 mm[5] |
| Alignment accuracy | — | < 10 nm[5] |
| Type | — | KrF scanner[6] |
| Exposure wavelength | — | 248/KrF[5] |
| Reduction | — | 4x[5] |
| Numerical aperture | — | 0.82[5] |
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