Comparison ledger
EV Group 101, KLA OP 7341 XP Film Thickness Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | |
|---|---|---|
| OEM | EV Group | KLA |
| Category | Lithography | Lithography |
| Wafer size | — | 25 wafer load ports (Asyst) with robot transfer (2 paddies) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | KLA OP |
| Specifications | ||
| OEM | EV Group[1] | KLA / Therma-wave[4] |
| Model | 101[1] | OP 7341 XP[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Configuration | — | CD (1D & 2D features) & film stack measurement[4] |
| Wafer size | — | 25 wafer load ports (Asyst) with robot transfer (2 paddies)[4] |
| Software | — | UNT 6.0[4] |
| Measurement functions | — | CD (1D & 2D features) & film stack measurement[4] |
| Alignment | — | Prealigner & full alignment using Vision Processing[4] |
| Computing | — | External Server SuperGrendel for fast computation (168 cores)[4] |
| Load ports | — | 25 wafer load ports (Asyst) with robot transfer (2 paddies)[4] |
| Environment | — | Integrated Mini-Environment[4] |
| Measurement chamber | — | Separated optical table design[4] |
| Motion isolation | — | Pneumatic floating system ensuring no vibration for both stage and optics tables[4] |
| User interfaces | — | Two user interface (Front & Read)[4] |
| Communication | — | SECS / GEM full capability[4] |
| Auto-focus | — | Included[4] |
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